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An NMOS Transistor Fabricated in A 0.18−μm0.18-\mu \mathrm{m} CMOS Technology Has L=0.54μmL=0.54 \mu \mathrm{m}

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An NMOS transistor fabricated in a 0.18−μm0.18-\mu \mathrm{m} CMOS technology has L=0.54μmL=0.54 \mu \mathrm{m} and W=W= 10.8μm10.8 \mu \mathrm{m} . The technology is specified to have μnCox=400μA/V2,Vtn=0.5 V\mu_{n} C_{o x}=400 \mu \mathrm{A} / \mathrm{V}^{2}, V_{t n}=0.5 \mathrm{~V} , and VA′=V_{A}^{\prime}= 5 V/μm5 \mathrm{~V} / \mu \mathrm{m} .
(a) If the device is operated in saturation with an overdrive voltage of 0.2 V0.2 \mathrm{~V} , find the required values of IDI_{D} and VGSV_{G S} , along with the resulting values of gmg_{m} and ror_{o} . (b) If the gate width is doubled but the value of VOVV_{O V} is maintained, what do the values of ID,gmI_{D}, g_{m} , and ror_{o} become?

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(a) Saturation with blured image,
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